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May 8, 2019 08:45 pm
Original Link: http://rss.slashdot.org/~r/Slashdot/slashdot/~3/7I1uNl6dvnQ/intel-process-technology-update-10nm-server-products-in-1h-2020-accelerated-7nm-in-2021
Intel Process Technology Update: 10nm Server Products in 1H 2020, Accelerated 7nm in 2021
Intel provided an update regarding its upcoming fabrication technologies at its 2019 Investor Meeting today. From a report: The company is on track to produce server-class products using its 10 nm manufacturing technology already in the first half of 2020. What is relatively surprising is that the company intends to start production of chips using its 7 nm process already in 2021. Intel's 7 nm production technology had been in development independently from the 10 nm process and by a different crew, so this one is closer than one might think. The node technology is set to use extreme ultraviolet lithography (EUVL) with laser wavelength of 13.5 nm for select layers, so it will not heavily rely on multipatterning, the source of problems with Intel's 10 nm process. In fact, the use of EUV will simplify development of products, make it easier to produce them, and will likely shorten production cycle times too.Read more of this story at Slashdot.
Original Link: http://rss.slashdot.org/~r/Slashdot/slashdot/~3/7I1uNl6dvnQ/intel-process-technology-update-10nm-server-products-in-1h-2020-accelerated-7nm-in-2021
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